A new hybrid deposition system has been installed at the premises of the unit. The deposition system is based on a HHV chamber on a conflat flange platform. The SS304 cylindrical chamber with a hemispherical base has multiple deposition ports and smaller ports for feedthroughs. The chamber is pumped down by a 700ls-1 turbo pump backed up by a dry pump. The system is configured with full-range gauges (BA gauges) to allow seamless pumpdown monitoring. The base pressure of the chamber is 1x10-8 mbar and the working pressure can vary from 10-4 to the 10-2 mbar.
The system has a Plasma-Ion Beam gun for surface treatment, cleaning and deposition purposes and furthermore it can be converted to an atom source with a simple modification. The Ion beam gun is compatible with several inert and reactive gases and primarily it will be used for hydrocarbon gases cracking for the deposition of Diamond-Like Carbon (DLC) thin films.
The system also has a nanoparticle source for production and deposition of nanoparticles based on the terminated gas condensation method. In front of the nanoparticle source there is a quadrupole filter for nanoparticle size selection and filtering. The final nanoparticle size can be controlled within a range of +-2% and the usual average size is between 1 to 20 nm.
The sample holder can accommodate large 4 inch wafers with rotation (up to 80rpm) and heating features (max 800oC). The system also has a differential pumped quadrupole residual gas analyzer (RGA) for monitoring the gas species of the main chamber.
Prof. Kelires has joined the Editorial Board of Scientific Reports - a Journal from the publishers of Nature
A new hybrid deposition system has been installed at the premises of the unit. The deposition system is based on a HHV chamber on a conflat flange platform. The SS304 cylindrical chamber with a hemispherical base has multiple deposition ports and smaller ports for feedthroughs. The chamber is pumped down by a 700ls-1 turbo pump backed up by a dry pump. The system is configured with full-range gauges (BA gauges) to allow seamless pumpdown monitoring. The base pressure of the chamber is 1x10-8 mbar and the working pressure can vary from 10-4 to the 10-2 mbar.
The system has a Plasma-Ion Beam gun for surface treatment, cleaning and deposition purposes and furthermore it can be converted to an atom source with a simple modification. The Ion beam gun is compatible with several inert and reactive gases and primarily it will be used for hydrocarbon gases cracking for the deposition of Diamond-Like Carbon (DLC) thin films.
The system also has a nanoparticle source for production and deposition of nanoparticles based on the terminated gas condensation method. In front of the nanoparticle source there is a quadrupole filter for nanoparticle size selection and filtering. The final nanoparticle size can be controlled within a range of +-2% and the usual average size is between 1 to 20 nm.
The sample holder can accommodate large 4 inch wafers with rotation (up to 80rpm) and heating features (max 800oC). The system also has a differential pumped quadrupole residual gas analyzer (RGA) for monitoring the gas species of the main chamber.
